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求购其他品牌 EPO-222 晶圆研磨、抛光

浏览次数:38

紧急求购,资金齐备,坐等发货

产品参数

选件 保修时间 状态 是否计量
不保修 完好 否
成色 发货周期 所在地 数量
二手 -- 深圳市 1
预算价格: 电议
更新日期:2025-01-17
联系电话:0755-86016691

*产品描述

产品描述:
EBARA EPO-222是一种全自动设备,设计用于晶圆和晶圆边缘的精密研磨、研磨和抛光。它是一台高通量的机器,具有270毫米的研磨和抛光面积,能够以经济高效的方式对大批量晶圆生产进行优化处理。该机器非常适合处理300 mm和300 mm宽I/O晶片,并且还能够处理所有常见的芯片类型。该系统由7.5 HP、2800 rpm主驱动电机提供动力,可提供最佳的研磨、研磨和抛光性能,而不会产生任何振动或共振。它还具有两级皮带驱动单元和可调节的张力机,有助于最大程度地减少过载造成损坏的风险。EBARA EPO222包括一个可编程的高速主轴和精确的线性定位工具,以帮助精确定位和精确研磨能力。主轴由高速微步进电机驱动,便于光滑甚至晶圆研磨。此外,还有一个集成的变频驱动器(VFD)来调节主轴转速,以便容纳各种材料。机器还包含一个中央研磨资产与自动楼梯进料模型,帮助实现快速和准确研磨操作。它还包含一个两级抛光设备,带有一个振荡电动机,在晶圆边缘和表面上达到非常高的表面光洁度。研磨抛光系统包括一个集成的真空吸尘装置,以确保清洁和可靠的操作。EPO 222带有一个尖端的软件界面,允许对系统设置(如研磨速度、功率、通过次数、研磨角度和抛光压力)进行全面定制。它配有触摸屏监视器和强大的HMI(人机接口)控制,便于操作和监控过程。总体而言,EPO222是一台功能强大、经济高效的精密晶圆研磨、研磨和抛光机,性能极佳,浪费最少。它具有强大的7.5 HP主驱动马达、高速主轴、有效的楼梯进给工具和精致的HMI。这使其成为高效处理最大表面质量的大容量晶片生产的理想资产。

其他要求

Product Description:
The EBARA EPO-222 is a fully automated device designed for precision grinding, grinding and polishing of wafers and wafer edges. It is a high-throughput machine with a 270mm grinding and polishing area that optimizes high-volume wafer production in a cost-effective manner. The machine is well suited for handling 300 mm and 300 mm wide I/O chips, and is also capable of handling all common chip types. Powered by a 7.5HP, 2800 rpm main drive motor, the system provides optimal grinding, grinding and polishing performance without any vibration or resonance. It also has a two-stage belt drive unit and an adjustable tension machine that helps minimize the risk of damage from overload. The EBARA EPO222 includes a programmable high-speed spindle and precise linear positioning tools to aid in precise positioning and precision grinding capabilities. The spindle is driven by a high-speed micro-stepper motor, which facilitates smooth and even wafer grinding. In addition, there is an integrated variable frequency drive (VFD) to adjust the spindle speed in order to accommodate a variety of materials. The machine also contains a central grinding asset with an automatic stair feed model to help achieve fast and accurate grinding operations. It also contains a two-stage polishing device with an oscillating motor that achieves very high surface finish on the wafer edge and surface. The grinding and polishing system includes an integrated vacuum suction device to ensure clean and reliable operation. The EPO 222 comes with a cutting-edge software interface that allows full customization of system Settings such as grinding speed, power, number of passes, grinding Angle and polishing pressure. It comes with a touchscreen monitor and powerful HMI (Human Machine interface) control for easy operation and monitoring of processes. Overall, the EPO222 is a powerful and cost-effective precision wafer grinding, grinding and polishing machine with excellent performance and minimal waste. It features a powerful 7.5HP main drive motor, high-speed spindle, efficient stair feed tools and a refined HMI. This makes it an ideal asset for high-volume wafer production that efficiently handles the maximum surface mass.

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