Product Description:
The AXCELIS/FUSION M 200 PCU is a fully configurable semiconductor wafer exposure device that provides the highest precision, highest quality EUV masking for leading-edge semiconductor device technology. Designed for 8-inch, 12-inch, and 16-inch wafer sizes, the system features an innovative large-size mask bench and smooth transfer motion - providing unprecedented stability and accuracy in mask writing. The FUSION M200PCU is designed to accelerate mask productivity with high-end mask throughput capabilities and next-generation calibration capabilities. It has four scan axes, x, y, theta and z, which improve mask writing accuracy and stability in the presence of thermal drift. The PCU allows for fast optimization and global overlay correction with user-selected exposure fields, as well as user-specified scan speeds and resolutions, resulting in accurate overlay alignment. The AXCELIS M200 PCU provides a user-friendly and intuitive graphical user interface. The integrated controller includes software tools for image quality analysis, adaptive correction, optimization, and enhanced control over cell functions. The machine can also be integrated with the ASTA Mask-Check tool, allowing users to monitor, measure and correct all exposed mask fields with a high degree of precision and control. PCU tools utilize high-performance laser lighting optical assets with excellent beam stability and power matching capabilities. It also features a large field, multi-slit beam transfer unit that allows uniform illumination throughout the mask field. The integrated dynamic beam shaping module provides superior, sharp reproduction of complex mask structural features. An optional exposure scanner attachment is available for pattern Tours with resolutions up to 0.25um. The M-200 PCU is equipped with high precision, thermal control, mask, and chip-level models with heated chip chucks for optimized process control. The unit is also equipped with a pulsed nitrogen gas tank to help minimize contamination, a suite of high-performance mechanical grades to provide high stability throughout exposure, and an air purification system to eliminate the potentially harmful effects of dust. The AXCELIS/FUSION M-200 PCU is a highly versatile unit capable of producing high-quality masks with high throughput capabilities while providing extreme accuracy, uniformity and process control. It is the ideal solution for the most advanced and demanding semiconductor masking applications.
