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求购其他品牌 SemVision G3 Lite 晶圆检测

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产品参数

选件 保修时间 状态 是否计量
不保修 完好 否
成色 发货周期 所在地 数量
二手 -- 深圳市 1
预算价格: 电议
更新日期:2025-01-06
联系电话:0755-86016691

*产品描述

产品描述:

SEMVision G3 Lite是Applied Materials SEMVision G3系列的一部分,该系列是业界最快,最敏感的缺陷审查和分析工具线,适用于65/45nm及以上的制造。新生产线的三个系统设定了行业基准,具有30纳米的灵敏度和每小时高达1800个缺陷的吞吐量。AMAT/APPLIED MATERIALS SemVision G3 Lite是一种掩模和晶圆检测设备,提供光掩模、微电子器件和显示器的自动化、高分辨率检测。该系统是分析标准光学检测系统难以检测的关键缺陷的理想选择。该设备采用自动化的高分辨率成像机,具有10倍的旋转运动舞台,可在600mm x 600mm的范围内观看。该工具还具有高速数字信号处理器,可在短时间内快速检查多个部件。光学元件采用光学显微镜和可调节的聚焦底座.可调底座可进行景深调节,还配备了机动化同步步进机构,用于精确的舞台运动。资产的图像处理软件套件提供了高度可靠和准确的缺陷检测,如颗粒污染、划痕、针孔、薄膜厚度变化和其他类型的缺陷。软件还结合了图样识别、聚类和尺寸测量等图像分析技术。该软件与Triad MEA平台集成,可快速进行图像捕获和分析。该模型还包括一个控制舞台运动、缩放和聚焦的鼠标界面。操作员还可以访问基于Web的远程应用程序来管理设备、监控实时性能、更新参数以及查看和导出捕获的图像。该系统先进的测量、精度和性能能力使其非常适合用于半导体、FPD和光掩模生产环境。此外,该装置还可用于新工艺和材料的研发以及质量控制、晶圆检测和介电层检测。

其他要求

Product Description:
 
SEMVision G3 Lite is part of Applied Materials' SEMVision G3 family, the industry's fastest and most sensitive line of defect review and analysis tools for manufacturing at 65/45nm and above. The three systems in the new line set an industry benchmark with a sensitivity of 30 nanometers and throughput of up to 1,800 defects per hour. AMAT/APPLIED MATERIALS SemVision G3 Lite is a mask and wafer inspection device that provides automated, high-resolution inspection of photomasks, microelectronics and displays. The system is ideal for analyzing critical defects that are difficult to detect with standard optical inspection systems. The device uses an automated high-resolution imager with a 10x rotating motion stage that can be viewed in the 600mm x 600mm range. The tool also features a high-speed digital signal processor to quickly inspect multiple parts in a short amount of time. The optical element uses an optical microscope and an adjustable focusing base. The adjustable base allows depth of field adjustment and is equipped with a motorized co-step mechanism for precise stage movement. The asset's image processing software suite provides highly reliable and accurate detection of defects such as particle contamination, scratches, pinholes, film thickness changes, and other types of defects. The software also incorporates image analysis techniques such as pattern recognition, clustering and dimensional measurement. The software is integrated with the Triad MEA platform for rapid image capture and analysis. The model also includes a mouse interface that controls stage motion, zooming, and focusing. Operators also have access to web-based remote applications to manage equipment, monitor real-time performance, update parameters, and view and export captured images. The system's advanced measurement, accuracy, and performance capabilities make it ideal for use in semiconductor, FPD, and photomask production environments. In addition, the device can be used for the development of new processes and materials as well as quality control, wafer inspection and dielectric layer inspection.

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