Product Description:
The VARIAN E500 EHP is a versatile, customizable and reliable ion implant and monitoring device. It provides robust and reliable performance for a variety of production and development environments. The system provides the ability to implant ions of different energies into a multi-purpose regional plate beam blanking unit. The machine is equipped with a 2-D accelerator operating at a maximum frequency of 5 MV, a 1000 Hz mass selection inlet, a 40 Gbps serial communication interface, and an interface module integrating charge neutralization and dosimetry tool control. A wide variety of implant configurations allow fast and accurate control of dose, temperature, beam energy, flood beam current, and other ion implantation parameters. The VARIAN E500EHP is configured with feature-rich Online Monitoring Assets (OMS) software for real-time process tracking. OMS provides the ability to tag defective wafers and optimize the implantation process. The dosimetry model allows for precise dose control that can be adjusted in real time as needed. The device includes a display/controller interface with a high-resolution digital color display, keyboard, and timer. The digital color display provides a full range of information including ion beam profiles, current and energy readings, and temperature control information. The E500-EHP meets current safety standards and is an ideal complement to any production, research and development facility. It provides ongoing remote maintenance and support, so engineers can fix any issues ahead of time. The EHP has these features and benefits, and the E500 provides a reliable and efficient ion implantation and monitoring system.
